Nanoparticle on wafer and in air is a major concern related to contamination control and YIELD enhancement in Semiconductor industry. While, the node-size decreases by a few nanometers, the traditional particle sensors currently deployed in FABs cannot monitor nanoscale particles (less than100nm). 

Furthermore, traditional particle metrology limits to site or stationary monitoring despite particle source is local.

Enmont revolutionizes airborne-particle sensing technology with breakthrough mobility and extreme sensitivity for semiconductor applications. The New applications can be expanded from conventional FAB air quality monitoring to advanced monitoring for Predictive Maintenance and Equipment Health Monitoring.

Nanoparticle is a marker of equipment state. When an equipment or a particular part needs maintenance or replacement, nanoparticle may be coming out from equipment. As a result, abnormal level of particle detection could be the sign of equipment maintenance. In addition to traditional time-based maintenance, predictive maintenance utilizing nanoparticle detection would reduce unexpected dead-time of equipment and reduce manufacturing cost.

Courtesy: Entegris/Brooks ATS

Your hand can reach parts, then PUFP can also access and monitor any piece of equipment due to compact sensor size and mobility. You may locate PUFP inside of FOUP (or ATS) in order to monitor nanoparticles that are generated by processing equipment.

Every second, PUFP will measure particle concentration change and report real-time data to you and the control tower wirelessly. By realtime detection of nanoparticles, the equipment that would require maintenance would be easily identified.

Courtesy: IBM Research

Equipment health monitoring is essential to the semiconductor industry for reducing the equipment dead-time and ultimately reducing manufacturing cost. Using PUFP that monitor nanoparticle, an equipment-state marker can help to find early failures before scheduled maintenance.

PUFP can provide step-by-step monitoring features:

  • Walk-through monitoring

  • Identification of unhealthy equipment

  • Specific identification of unhealthy parts or process

Walk-through Monitoring: Although FAB’s air flows from top to bottom, nanoparticles will diffuse everywhere while microparticles follow air stream. During walking-through FAB, PUFP will detect nanoparticles diffusing from unhealthy equipment near path. PUFP is extreamly sensitive and will not miss to detect any nanoparticle.

Unhealthy Equipment Identification: When abnormal nanoparticle exposure is detected during Walkthrough monitoring, PUFP will lead the examiner to close in on unhealthy equipment that is generating nanoparticles to FAB. When closing in on unhealthy equipment, level of nanoparticle concentration will increase. PUFP will detect the increase.

Particle Source Detection of Unhealthy Equipment: PUFP will identify unhealthy parts of equipment generating nanoparticles. PUFP has excellent feature of spatial resolution. Although the unhealthy part is small or narrow, PUFP will identify the location of part precisely. After identifying the unhealthy part, maintenance would be followed.

  • Health assessments ensure F-35 crew

  • To conduct state of the art air quality and heat stress assessments on F-35A Lightning II maintainers

       (Courtesy: USAF,56th Fighter Wing Public Affairs Published)


"The NYS Department of Environmental Conservation (NYSDEC) designed the Albany South End Community Air Quality Study in response to community concerns regarding air quality in this community.

The Portable Monitors – Backpack Units UFPs were measured with the Enmont PUFP water-based condensation particle counter. This instrument operates the same way as the API Model 651 described above but is portable, battery powered, and has a global positioning system (GPS). Using the GPS signal allows this instrument to make a map of the number of UFPs in different locations. It records these data every second"

Copyright © 2020 Enmont LLC. All Rights Reserved.